Influence of N-2 flow ratio on the properties of hafnium nitride thin films prepared by DC magnetron sputtering
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备注：Applied Surface Science, 253, 20, 8538-8542, 2007.
全部作者：X. Zhao, H. Gao, Y. Cheng, L. Ai, N. Liu, M. Wang, C. Li, G. Fang, L. Yuan
是否译文：否