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铜铟镓硒光吸收层薄膜的四元单靶射频磁控溅射制备方法（201110388411.9）

2017-08-08 Hits:

Patent Applicant:李晶泽,冯利东,徐晓辉,周爱军,戴新义

Service Invention or Not:no

Pre One:一种P型硅化物热电材料的制备方法（CN101935042A）

Next One:锂离子电池锡钛薄膜负极的磁控溅射制备方法（CN102212789A）

Zhou Aijun

Gender:Male Education Level:With Certificate of Graduation for Doctorate Study Degree:Doctor of Engineering Status:Professor E-Mail:

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